Sub-Micron Device Fabrication Laboratory, G. Taylor. This laboratory features a Class 100 clean room containing an MBE system or III-V material growth, reactive ion etching (RIE), refractory metal sputtering, metal and dielectric deposition, and rapid thermal annealing(RTA). Activities include device fabrication and characterization. Current research is dedicated to optoelectronic integrated devices for communications and optoelectronic computing.
For more information, please visit the ECE Department page of Professor G. Taylor.