11/07/2025 Prof. Necmi Biyikli – UConn
Atomic Layer Deposition: How Surface Chemistry Works for Precision Materials Engineering from Semiconductor Chips to Solar, Batteries, and Implants
Friday, November 7, 2025 11:15am, ITE 336
Abstract: In this presentation, I would like to provide the current state-of-the-technology in semiconductor chip manufacturing – an engineering marvel that started in the early 1960s and became the most critical technology today fueling the age of AI. Then, I’ll introduce what atomic layer deposition (ALD) stands for and how this specific materials synthesis technique impacted semiconductor manufacturing – literally saving the whole industry at multiple inflection points. This will be followed by summarizing what other domains (energy, biomedical) have benefited from ALD materials and processing. I will end my talk by sharing our contributions to the field of plasma-assisted ALD of wide bandgap semiconductors for applications in computing, energy, catalysis, and wearables.
Biographical Sketch: Dr. Necmi Biyikli is an Associate Professor of Electrical & Computer Engineering at The University of Connecticut. His current research spans ALD of nanoscale semiconductor materials for CMOS, energy, sensing, and flexible electronics. He is a member of the American Vacuum Society (AVS), a Marie Curie Fellow (2010) and is the recipient of The Parlar Foundation Research Incentive Award (2014). See https://www.ee.uconn.edu/necmi-biyikli/
Categories: Seminars
Published: November 4, 2025
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